Plasma Control Equipment

RF Generators

Users have full control over advanced performance accelerators, including repeatability, multi-level pulsing, and high-speed communication. This high level of responsiveness delivers actionable insights and enables more complex plasma applications than previously possible, providing a new depth of control. As a result, higher yield is achieved through fast and agile process control, delivering superior repeatability, faster tuning, and customized wave shaping.  **Features** - Power accuracy and repeatability - Multi-level pulsing (four user definable levels) - Customizable frequency tuning per level - Versatile arc management - Digital metrology and intuitive graphical user interface - Digital system control for advanced manufacturing technologies **Benefits** - Seamless integration into process systems - Ultra-fast plasma process control - Tighter repeatability delivers improved yield - Fast configurable rise/fall time of pulsing - Consistent process and wafer level uniformity 

RF Matching Network

## Improve process repeatability, yield and throughput Our RF design engineers create a full range of industry leading matching network solutions that meet or exceed your specifications and time to market.  Our RF Impedance Matching Networks regularly outperform those of our competitors. Our sensors and controls combine to make some of the fastest tuning matching networks in the industry. Unlike other matching network suppliers, we have a full line of variable vacuum capacitors and the experts to design these key elements. With close collaboration between the two teams, Comet is in the unique position to create products that no other competitor can offer. The Synertia® RFM works in powerful synergy with the Synertia® RFG. Precise sensors and an enhanced tuning algorithm in the matching network ensure consistent and stable plasma processes. **Features:** - Advanced customer-accessible metrology data - Real-time data streaming: - Full access to all available data from Synertia® RFG and RFM devices that allows reaction in real-time to change, accelerate process development and post-analyze incidents - On-board monitoring and diagnostics to assist with preventive maintenance and enable actionable insights for more complex plasma applications - Integration of Comet Vacuum Capacitors: - Standard and customized capacitor designs, equipped with advanced technologies such as Ultra Life drive system or XtraVolt features for low frequency applications **Benefits** - Continuous process improvement via real time signal processing and data collection - Superior process control and repeatability with fully digital and customizable controls - Consistent, stable RF plasma with enhanced tuning algorithm - Reduced total cost of ownership with improved MTBF and enhanced reliability - Robust design with RF expertise, state-of-the-art modeling/virtual prototyping and extensive library of RF tuning circuits. **Technical data:** **Match types:** Single frequency, Dual frequency **Available matching topologies:** L, T, and Pi match **Frequency range:** 400 kHz - 60 MHz **Output V/l:** max. current (~150 APEAK) max. voltage (10 kVPEAK) **Input power:** to 15 kW **Communication interface:** EtherCAT®, RS232, analog, Ethernet **Pulsing:** Single, dual and multi-level **Pulsing state time:** 5 µsec to 1 second **Pulsing capability:** 0.5 Hz to 100 kHz **External pulse sync:** TTL **Advanced features:** ± 10% frequency range **Optional sensors:** Vpp, Vdc and others **Input voltage:** 24 VDC **Tune time:** < 1 sec depending on pre-set points **Tuning range:** Depends on unit frequency and on the tuning coil installed

Vacuum Capacitors