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Plasma Control Equipment

We offer most advanced RF Power systems and diagonostic tools. Unified in the goal to drive the evolution of the semiconductor, flat panel display, battery, medical industry, we provide our customers with the most precise tools to master the plasma processes.

Applications

3 applications

RF Generators

Users have full control over advanced performance accelerators, including repeatability, multi-level pulsing, and high-speed communication. This high level of responsiveness delivers actionable insights and enables more complex plasma applications than previously possible, providing a new depth of control. As a result, higher yield is achieved through fast and agile process control, delivering superior repeatability, faster tuning, and customized wave shaping.Features:Power accuracy and repeatabilityMulti-level pulsing (four user definable levels)Customizable frequency tuning per levelVersatile arc managementDigital metrology and intuitive graphical user interfaceDigital system control for advanced manufacturing technologiesBenefitsSeamless integration into process systemsUltra-fast plasma process controlTighter repeatability delivers improved yieldFast configurable rise/fall time of pulsingConsistent process and wafer level uniformity

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RF Matching Network

Improve process repeatability, yield and throughputOur RF design engineers create a full range of industry leading matching network solutions that meet or exceed your specifications and time to market.Our RF Impedance Matching Networks regularly outperform those of our competitors. Our sensors and controls combine to make some of the fastest tuning matching networks in the industry.Unlike other matching network suppliers, we have a full line of variable vacuum capacitors and the experts to design these key elements. With close collaboration between the two teams, Comet is in the unique position to create products that no other competitor can offer.The Synertia® RFM works in powerful synergy with the Synertia® RFG. Precise sensors and an enhanced tuning algorithm in the matching network ensure consistent and stable plasma processes.Features:Advanced customer-accessible metrology dataReal-time data streaming:Full access to all available data from Synertia® RFG and RFM devices that allows reaction in real-time to change, accelerate process development and post-analyze incidentsOn-board monitoring and diagnostics to assist with preventive maintenance and enable actionable insights for more complex plasma applicationsIntegration of Comet Vacuum Capacitors:Standard and customized capacitor designs, equipped with advanced technologies such as Ultra Life drive system or XtraVolt features for low frequency applicationsBenefits:Continuous process improvement via real time signal processing and data collectionSuperior process control and repeatability with fully digital and customizable controlsConsistent, stable RF plasma with enhanced tuning algorithmReduced total cost of ownership with improved MTBF and enhanced reliabilityRobust design with RF expertise, state-of-the-art modeling/virtual prototyping and extensive library of RF tuning circuits.

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Vacuum Capacitors

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