RF Generators

Users have full control over advanced performance accelerators, including repeatability, multi-level pulsing, and high-speed communication. This high level of responsiveness delivers actionable insights and enables more complex plasma applications than previously possible, providing a new depth of control. As a result, higher yield is achieved through fast and agile process control, delivering superior repeatability, faster tuning, and customized wave shaping.  **Features** - Power accuracy and repeatability - Multi-level pulsing (four user definable levels) - Customizable frequency tuning per level - Versatile arc management - Digital metrology and intuitive graphical user interface - Digital system control for advanced manufacturing technologies **Benefits** - Seamless integration into process systems - Ultra-fast plasma process control - Tighter repeatability delivers improved yield - Fast configurable rise/fall time of pulsing - Consistent process and wafer level uniformity