Product Details
**Efficient batch system for removal of photoresist** The batch system V10-G is designed for the removal of photoresists. Furthermore it can be optimally used for the cleaning of wafers. **Areas of application** - Ideal system for removing photoresist layers (also SU-8) after dry processes like RIE or Ion Beam etching as well as after high dose implant processes - Silicon wafers or other substrate cleaning prior wet processing to achieve a better wettability for an uniform and efficient result - Applicable for processes in MEMS and nano technology - Polymer removal e.g. after Bosch processes - Removal of organic sacrificial layers Conditioning of bioactive compounds