Low Pressure Horizontal High Temperature Diffusion Furnace

Mainly used for forming PN junction of diffusion doping of silicon wafer in the manufacturing process of crystalline silicon solar cell. Process Flow:prepare quartz boat & wafers→insert wafers→loading→chose process→boat in→vacuumize →stable temperature increase→oxygen in→power on→put in→constant temperature→boat out→boat unloading and cooling→testing→wafers unloading